International Publications (1998)

  1. "Computational two - dimensional finite - element analysis of flow behavior inside microfluidic amplifiers", Eliphas Wagner Simões, Rogério Furlan e Jay N. Zemel, Technical Proceedings of 1998 International Conference on Modeling and Simulation of Mycrosystems Semiconductors, Sensors and Actuators, CA, E.U.A., 6 a 8 de abril de 1998, p. 480-485.
  2. "A general purpose silicon based electrochemical sensor - development and characterization", Marcelo Bariatto Andrade Fontes, Rogério Furlan, Jorge J. Santiago- Aviles e Koiti Araki, Anais da XIII SBMicro - International Conference on Microelectronics and Packaging ICMP'98, Curitiba, PR, Brasil, 12 a 14 de Agosto de 1998, p. 291-297.
  3. "Microfluidic amplifiers fabricated in silicon", Eliphas Wagner Simões, Ronaldo Domingues Mansano, Rogério Furlan, e Patrick Verdonck, Anais da XIII SBMicro - International Conference on Microelectronics and Packaging ICMP'98, Curitiba, PR, Brasil, 12 a 14 de Agosto de 1998, p. 175-181.
  4. “Back Gate Voltage Influence on the LDD SOI nMOSFET Series Resistance Extraction from 150 to 300K”, A. S. Nicolett, J. A. Martino, E. Simoen and C. Claeys, in P.L.F. Hememment (ed), Pespectives, Sciences and technologies for Novel Silicon on Insulator Devices, NATO, Kieve, Ucrânia, , Outubro, 1998.
  5. “Effect of the Substrate Potential Drop in Accumulation-Mode SOI pMOSFETs Subthreshold Slope”, M. A. Pavanello and J. A. Martino, International Conference on Microelectronics and Packaging, Curitiba - PR, agosto, 1998.
  6. “The Influence of the Back Gate Voltage on the Leakage Drain Current in Accumulation-Mode SOI MOSFETs at High Temperatures”, M. Bellodi and J. A. Martino, International Conference on Microelectronics and Packaging, Curitiba - PR, agosto, 1998.
  7. “A New Method for Determination of the Oxide Charge Density at the Buried Oxide/Substrate Interface in SOI Capacitor”, V. Sonnenberg and J. A. Martino, International Conference on Microelectronics and Packaging, Curitiba - PR, agosto, 1998.
  8. “Optimization of the Twin Gate SOI MOSFET”, P. T. Hoashi and J. A. Martino, International Conference on Microelectronics and Packaging, Curitiba - PR, agosto, 1998.
  9. “A New Method to Extract the Effective Trap Density at the Buried Oxide/Underlying Substrate Interface in Enhancement-Mode SOI MOSFETs at Low Temperatures”, M. A. Pavanello and J. A. Martino, III European Workshop on Low Temperature Electronics, San Miniato, Itália, p. Pr3-45, junho, 1998.
  10. “Analysis of the Susbstrate Effect on Enhancement-Mode SOI nMOSFET Effective Channel Length and Series Resistance Extraction at 77 K”, M. A. Pavanello, A. S. Nicolett and J. A. Martino, III European Workshop on Low Temperature Electronics, San Miniato, Itália, p. Pr3-49, junho, 1998.
  11. “Back Gate Voltage and Buried-Oxide Thickness Influences on the Series Resistance of Fully Depleted SOI MOSFETs at 77 K ”, A. S. Nicolett, J. A. Martino, E. Simoen and C. Claeys, III European Workshop on Low Temperature Electronics, San Miniato, Itália, p. Pr3-25, junho, 1998.
  12. "Development of a Low Temperature High Quality Silicon Oxide Deposition Process", C.E. Viana and N.I. Morimoto; International Conference on Microelectronics and Packaging, pp 388-392, Curitiba, PR, 1998.
  13. "Argon Influence in the PETEOS Silicon Oxide Deposition Process"; C.E. Viana, A.N.R. Silva and N.I. Morimoto; International Conference on Microelectronics and Packaging, pp 481-483, Curitiba, PR, 1998.
  14. "Gas Flow Simulation in a PECVD Reactor"; A.N.R. Silva and N.I. Morimoto; International Conference on Microelectronics and Packaging, pp 194-201, Curitiba, PR, 1998
  15. "The defects induced in deep regions by ion implantation of BF2+ and effects of the annealing temperature as determined from the JxV characteristics of pn junctions", M. M. Oka, A. Nakada, Y. Tamai, T. Shibata, and T. Ohmi; ; International Conference on Microelectronics and Conference on Micropackaging - ICMP'98; XIII SBMicro, Aug. 10-14; 1998; Curitiba, PR, Brazil; Proceedings - I - of the International Conference on Microelectronics and Packaging - ICMP '98, p. 380-387
  16. “Influence of the Substrate Temperature on the Raman Spectra of Diamondlike Carbon Thin Films Produced by Sputtering”, M. Massi, H.S. Maciel, L.N. Nishioka, C. Otani, R.D. Mansano, P. Verdonck, International Conference on Microelectronics and Packaging, pp 35-40, Curitiba, PR, 1998.
  17. “Etching of deep trenches in silicon with inductively coupled plasmas”, R.D. Mansano, P. Verdonck, H.S. Maciel, International Conference on Microelectronics and Packaging, pp 163-169, Curitiba, PR, 1998.
  18. “Comparison between Single and Double Langmuir Probe Techniques for Analysis of Inductively Coupled Plasmas”, R.M. de Castro, G.A. Cirino, P. Verdonck, H.S. Maciel, M. Massi, M.B. Pisani, R.D. Mansano, International Conference on Microelectronics and Packaging, pp 508-514, Curitiba, PR, 1998
  19. “Study of CF4+H2 plasma surface fluorination of PMMA as cladding process for plastic optical fibres”, J.R. Bartoli, R.D. Mansano, P. Verdonck, M.N. Carreño, R.A. da Costa, S.C. de castro, O.L.B. Martins, S. Leone Filho, 7th Internation Plastic Optical Fibres Conference ’98, pp. 59-66, Berlin, Alemanha, 1998
  20. “Re-engineering Electrical Engineering Undergraduate Laboratories at Escola Politécnica, University of São Paulo”, Seabra, A.C.; Consonni, D., International Conference on Engineering Education, ICEE98 CD nr. 109, Rio de Janeiro, 1998.
  21. “Design of a Measurement and Interface Integrated Circuit for characterization of Switched Current memory Cells”,  A.M.Pereira, T.C. Pimenta, R.L.Moreno, A.M. Jorge, E.Charry R., XI International Conference VLSI DESIGN’1998.
  22. “AIGaAs/GaAs HEMT 5-12 GHZ Integrated system for and optical receiver”, R. Reina A. Olmos, E.Charry R., IEEE International Symposium on  Circuits and Systems 1998.
  23. “A 5Ghz continuous time sigma-delta modulator implemented in 0.4 um InGaP/InGaAs HEMT techcnology”, A. Olmos, T. Miyashita,  M. Nihei,  Y.Watanabe, E.Charry R., IEEE International Symposium on  Circuits and Systems 1998.
  24. “Construcao de finos diafragmas en laminas de silicico altamente dopadas com Boro visando fabricacao de microsensores de pressao CMOS utilizando pos-processamento”, H Furlan, E.Charry R., IV Workshop IBERCHIP, 1998.
  25. “A Temperature Compensation Subsystem for an IMEMS Pressure sensors”, F. Chavez, A. Olmos, C.A. Leme, E.Charry R., II Th ANNUAL IEEE Intenational ASIC Conference, 1998.
  26. "Deposition of silicon nitride films by LPCVD assisted by high density plasma", Luis da Silva Zambom, Ronaldo Domingues Mansano e Rogério Furlan, Abstract Book, 14 th International Vacuum Congress (IVC-14) and 10th International Conference on Solid Surfaces (ICSS-10), Birmingham, UK, 31, August - 4 September 1998, p. 342.
  27. "A study of modified silicon based microelectrodes for nitric oxide detection", Marcelo Bariatto Andrade Fontes, Rogério Furlan, Jorge J. Santiago-Aviles, Koiti Araki, Lúcio Angnes, Abstract book, First Iberoamerican Congress on Sensors and Biosensors, November 9-13, Havana University, Abstract P4-63, p. 72, 1998.
  28. “Oxygen Plasma Etching of diamond coatings over WC-Co”, S.P. Silva, R.D. Mansano, A.M.P. Passaro, P. Verdonck, M.C. Salvadori, I.G. Brown, 25th Anniversary International Conference on Metallurgical Coatings and Thin Films, San Diego, CA, USA, abril 1998.
  29. “Study of CF4 +H2 plasma surface fluorination of PMMA as cladding process for plastic optical fibres”, J.R. Bartoli, R.D. Mansano, P. Verdonck, M.N.P. Carreño, R.A. da Costa, S.C. de Castro, R.L. Filho, O.L.B. Martins, International Conference on Plastic Optical Fibres and Applications , Berlin, Alemanha, outubro 1998.
  30. “Hybrid parabolic profile and binary surface-relief phase element used in the production of multiples continuous lines over high angle", L. Goncalves Neto, P. Verdonck, R.D. Mansano, G.A. Cirino, M.A. Stefani, 1998 OSA Annual Meeting, Baltimore, MD, USA, outubro 1998, PD 25 -1
  31. “Anisotropic inductively coupled plasma etching os silicon with pure SF6”, R.D. Mansano, P. Verdonck, H.S. Maciel, M. Massi, Abstract books of the 14th International  vacuum conference, Birmingham, UK, setembro 1998, pp. 79.
  32. ”Effects of plasma etching on Raman scattering of DLC films”, M. Massi, R.D. Mansano, P. Verdonck, H.S. Maciel, Abstract books of the 14th International  vacuum conference, Birmingham, UK, setembro 1998, pp. 67.
  33. “Influence of accumulation Layer on Interface Trap Density Extraction”, V. Sonnenberg and J. A. Martino, Electronics Letters, vol. 34, n. 25, p.2439, 1998.
  34. “Silicon surface roughness induced by SF6- based reactive ion etching processes for micromachining applications”, Verdonck, Mansano, Maciel, Salvadori, Journal of solid-state devices and circuits, vol 6 number 1. (feb. 1998)
  35. “Anisotropic reactive ion etching in silicon, using a graphite electrode”, Mansano, Verdonck, Maciel, Sensors and Actuactors A, 65, 180 (1998)
  36. "Application of Undoped PETEOS SiO2 as a Sacrificial Layer in the Fabrication of Free - Standing Polysilicon Microfilaments", E. W. Simões, R. Furlan, N. I. Morimoto, O. Bonnaud, A. N. R. da Silva, M. L. P. da Silva; submitted to the Journal of Solid State Devices and Circuits (Dec. 98)
  37. "Deposition  of  thick  TEOS  PECVD  silicon  oxide layer  for integrated optical  waveguides applications"; P. Bulla, N. I. Morimoto; Thin Solid Films, 334(1998), pp.60-64
  38. “Re-Engineering Undergraduate Laboratories with LabVIEW”, Seabra, A.C.; Consonni, D.; Academic Instrumentation Newsletter, National Instruments, volume 10, number 2, p. A3, 1998.
  39. "Phospholipid Wetting on SiO2 Surfaces", Carmona-Ribeiro, A.M.; Salay, L.C., Abstract of Papers of the American Chemical Society- ACS, n.216, Pt.1, (1998), pp. 108-COLL.
  40. "Synthetic Bilayer Wetting on SiO2 Surfaces", Salay, L.C.; Carmona-Ribeiro, A.M., J. Phys. Chem B, 102, (1998), 4011-4015.

 
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