International
Publications (1991)
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"Study of the Thermal Stability of the Al/TiW/TiSi2/Si
Structure", R.Furlan, J.V.Spiegel, J.W.Swart, J.Electrochemical Society;
Vol.138, nº 8, 2419, 1991.
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"The Influence of Impurities on Cobalt Silicides
Formation", W.J. Freitas, J.W.Swart, J.Electrochemical Soc,; Vol.138, nº
10, 3067, 1991.
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"Impact of Silicon Surface Characteristics
on MOS Device Yield for VLSI", M. Heyns, C.M. Hasenack e R. Dekeersmaecker,
Microelectronic Engeneering 1-0 (1991) 235-257.
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