International
Publications (1990)
-
"Analysis of TiW Alloy as a Contact Barrier
Between Al and TiSi2", R.Furlan, J.Van der Spiegel and J.W.Swart, 177th
Meeting of the Electrochemical Society Montreal, Canada, May 6-11, 1990,
paper nº 157
-
"Impact of Silicon Surface Characteristics
in MOS Device Yield for VLSI", M.Heyns, C.M. Hasenack, R. Dekeersmakere
R. Falster, Summercourse on Manufacturing Science, IMEC vwz, Leuven, Bélgica,
Junho 1990.
-
"Analysis of the Influence of Impurities in
Co Films on Silicide Formation", W.J.Freitas and J.W.Swart, 177th Meeting
of the Electrochemical Society Montreal, Canada, May 6-11, 1990, paper
nº 169
-
"Rapid Thermal Flow of PSG Films in Vacuum
Using A Graphite Heater", S.G.dos Santos F. and J.W.Swart, J.Electrochemical
Society, april 1990.
-
"Model for the Potential Drop in the Silicon
Substrate for thin-film SOI MOSFET's", J.A.Martino, L.Lauwers, J.P.Colinge
and K.de Meyer, IEE Electronics Letters, England, vol.26, nº 18, August,
1990.
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"Analytical Model for the Potential Drop in
the Silicon Substrate on thin-film SOI MOSFET's and its Influence on the
Threshold Voltage", J.A.Martino, L.Lauwers, J.P.Colinge, SPIE Society of
Photo-Optical Instrumentation Engineers, Washington, USA, vol.1405, July,
1990.
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