International
Publications (1988)
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"Titanium Silicide Formation and Arsenic Dopant
Behaviour Under RTP in Vacuum", R.Furlan and J.W.Swart, The Electrochemical
Society Soft Bound Proceedings Series (PV 89-6), H.S. Rathore, G.C. Schwartz,
and R.A., Susko, Editors, 1988, p.458.
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"The Doping of Silicon with Boron by Rapid
Thermal Processing", J.P.de Souza, C.M.Hasenack, J.W.Swart, Semiconductor
Science and Technology, 3;277, 1988.
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